Mr Charan Panesar (Cleanroom Supervisor)
tel: +44 (0)1904 32 2384
Further facilities are available at the York JEOL Nanocentre.
The Department of Electronic Engineering has a clean room, validated at better than Class 10,000 (Class J BS5295), with facilities for preparation, fabrication and measurement. It was completed in 1989, and is used to support research into novel electron devices and circuits.
Second year students undertake a device fabrication laboratory that allows them to build their own component on a silicon wafer. The clean room and associated microscopy facilities are used in final year projects.
The clean room offers:
The facilities may also available to industry in some cases.
Thermal Oxidation FurnaceA furnace is available for the wet oxidation of silicon wafers up to 4 inches diameter.
EvaporatorA variety of metals can be deposited onto a substrate from a molten source in a vacuum. Bell jar diameter = 29cm.
Plasma Reactive Ion Etcher (RIE)A plasma reactive ion etcher is used to excite gases in order to etch certain materials such as silicon, gallium arsenide, aluminium and films of organic materials (in particular, photoresists, used to create nanopatterned materials).
Mask Alignment PhotolithographyThe clean room suite has an ultra-clean room with much lower airborne particle concentrations. The room is equipped with lamina flow benches and filtered amber lighting for photolithography. Equipment includes a mask aligner (up to 3 inch wafers), a photoresist spinner, a wet chemical workstation and a high power optical microscope with frame grabber.
Wire BonderThe wedge bonder will bond gold and aluminium wire for device connection to package pins.
Silicon Micro-MachiningWet chemical etching, as well as reactive ion etching, can be used to produce small "micro-machined" objects based on silicon single crystal wafers.
Bench SpaceWe can offer bench space for the assembly of components in a clean environment. Area = 1m x 0.6m.
This instrument is used to check layer thickness
AFMAn atomic force microscope (AFM) is available. This instrument can measure samples of 1 cm2 size. It can resolve nanoscale features and produce 2D and 3D images.
Hall Effect Probe StationThe Hall effect probe station can measure magnetoresistance and the Hall effect on samples with an area up to 1cm2. The samples can be cooled with LN2 to minimise thermal noise during measurement.
Micro Manipulator Probe StationFine probe needles are employed to measure resistance and diode characteristics in the x – y plane.
Scanning Electron Microscope
An electron microscope is available for the examination of structures. Resolution 3-5 nm.