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Extreme ultra-violet laser applications

Contact person: Greg Tallents

EUV LaserInstallation of the EUV laser

Extreme ultra-violet (EUV) light has many realised and potential applications.For example, the fastest computers chips are now processed using EUV light to expose photo-resist.  EUV light can be focused to widths approaching the wavelength of the light enabling small features in photoresist to be exposed. 

The work on EUV lasers at YPI uses a capillary discharge in argon plasma to produce laser output at wavelength 46.9 nm.  Work is ongoing to develop the laser for the ablation of micro-features in solids and to understand the physics of the high density plasmas formed by EUV laser ablation. 
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