Contact person: Greg Tallents
Installation of the EUV laser
Extreme ultra-violet (EUV) light has many realised and potential applications.For example, the fastest computers chips are now processed using EUV light to expose photo-resist. EUV light can be focused to widths approaching the wavelength of the light enabling small features in photoresist to be exposed.
The work on EUV lasers at YPI uses a capillary discharge in argon plasma to produce laser output at wavelength 46.9 nm. Work is ongoing to develop the laser for the ablation of micro-features in solids and to understand the physics of the high density plasmas formed by EUV laser ablation. Click here for more detail.